Full-automatic type with sample transfer system

Fully automatic non-contact sheet resistance measurement system for flatpanel display

NC-60F/RS-1300N

Image of Product

  • Full-automatic type with sample transfer system

Selling Points

  • Global standard for non-contact measurement of ITO film, Metal thin films on flat panel
  • Automatic X-Y and Z (eddy current probe head) axis moving mechanism
  • Compatible with Loading robot for fully automatic measurement
  • Option :
    Integlate to combined system (film thickness meter, etc)
    Add 4 point probe measurement unit : RT-3000

Details

Applications

Conductive thin film (Metal, ITO etc)

Sample sizes

~ 2,880 x 3,080mm

Measuring range

[RS]

<1. for ITO>  5~800 Ω/sq

<2. for Metal thin film> 10m ~ 10Ω/sq

[ITO film thickness] 20 nm (200A)~500 nm (5,000A)

Image of Mapping

  • Full-automatic type with sample transfer system
  • Full-automatic type with sample transfer system

Non-contact measurement wafer sorting system (Belt drive tranceportation)

NC-6800

Image of Product

  • Full-automatic type with sample transfer system

Selling Points

  • Non-contact measurement of resistivity, thickness and conductivity (P/N)
  • Number of cassette station can be changed by customers request
  • Eddy current method for resistivity, Electric capacitance method for wafer thickness
  • Temperature correction for silicon wafer function

Details

Applications

  • Semiconductor materials, Solar-cell materials (Silicon, Polysilicon, SiC etc)

Sample sizes

3 ~ 8 inch

Measuring range

[R] 1m ~ 200Ω・cm

[Thickness] 150 ~ 800μm (300μm between 150 and 800μm is recommended)

* The range is separated from each Low, Middle, High and S-High probe type.

*Please refer the measurement range for each probe type as below;
(1) Low : 0.01~0.5Ω/□ (0.001~0.05Ω‐cm)
(2) Middle : 0.5~10Ω/□ (0.05~0.5Ω‐cm)
(3) High : 10~1000Ω/□ (0.5~60Ω‐cm)
(4) S-High : 1000~3000Ω/□ (60~200Ω‐cm)

Non-contact measurement wafer sorting system (Robot hand tranceportation)

NC-3000R

Image of Product

  • Full-automatic type with sample transfer system

Selling Points

  • High accuracy measurement system for large diameter wafer
  • Non-contact measurement of resistivity, thickness and conductivity (P/N)
  • Compact design of Two-stage by measuring area and transfer area
  • Number of cassette station can be changed by customers requestOption : Add wafer flattness measurement system(FLA-200)

Details

Applications

  • Semiconductor materials, Solar-cell materials (Silicon, Polysilicon, SiC etc)

Sample sizes

6 ~ 8 inch, or 12 inch

Measuring range

[R] 1m ~ 200Ω・cm

[Thickness] 150 ~ 800μm (300μm between 150~800μm)

* The range is separated from each Low, Middle, High and S-High probe type

*Please refer the measurement range for each probe type as below;
(1) Low : 0.01~0.5Ω/□ (0.001~0.05Ω‐cm)
(2) Middle : 0.5~10Ω/□ (0.05~0.5Ω‐cm)
(3) High : 10~1000Ω/□ (0.5~60Ω‐cm)
(4) S-High : 1000~3000Ω/□ (60~200Ω‐cm)