• Possible to measure wide range of sheet resistance by installing Max. 4 probes
  Min. 7 mm position from edge can be measured
• User programable measurement pattern & programmable measuring pattern
• *Option: thickness measurement probe (for silicon wafer)

• Semiconductor materials, Solar-cell materials (Silicon, Polysilicon, SiC etc)
• New materials, functional materials (Carbon nanotube, DLC, graphene, Ag nanowire etc)
• Conductive thin film (Metal, ITO etc)
• Silicon-related epitaxial materials, Ion-implantation sample
• Chemical compound semiconductor (GaAs Epi, GaN Epi, InP, Ga etc)
• Others (*Please contact us for details)

2 ~ 8 inch (Option; 12 inch)

[R] 1m ~ 200 Ω・cm

[RS] 10m ~ 3,000 Ω/sq

* The range is separated from each Low, Middle, High and S-High probe type.

*Please refer the measurement range for each probe type as below;
(1)   Low ： ０.０１～０.５Ω/□ （０.００１～０.０５Ω‐ｃｍ）
(2)  Middle ： ０.５～１０Ω/□ （０.０５～０.５Ω‐ｃｍ）
(3)  High ： １０～１０００Ω/□ （０.５～６０Ω‐ｃｍ）
(4)  S-High ： １０００～３０００Ω/□ （６０～２００Ω‐ｃｍ）

• Ultra-High range sheet resistance measurement for 10E+9 ~ 10E+15 ohm/sq without contacting
• Mapping program software;
• 1. Arranged in a multipoint pattern measurement is programmed
• 2. 2-D & 3-D mapping software
• Easy operation by Windows 7 system software
• Measurement data base link with Excel via CSV format file
• Unaffected by contact resistance

*Corona Discharge Method : Pat. No.5510629

Joint development with Yamagata Univ.

(Associate Professor : Dr. Toshiyuki Sugimoto)

Any sample within the measurement range can be measured.

• Thin film layer (a-Si, IGZO etc)
• Coating material
• Semiconductor material
• Approximate material as Insulator

*Please contact us for details.

Size : Max. 300 x 400 mm (or more)

Thickness : Max. 2 mm

*We can design as your requirement. Please contact us for customize.

10E+9 ~ 10E+15 ohm/sq